Molecules and literature
Materials database
Search precursors by name, formula or CAS number, compare reported temperature, pulse, purge and growth rate, then trace each recipe to its paper.
Precursor entries by elementtop 5
ALDKIT research suite · MDNM team, HUST
Model every layer, from precursor to reactor.
ALDKIT links 15,074 published process records with atomistic film-growth and reactor-scale simulation, so a literature search can become a simulated experiment.
15,074 process records 770 precursors 6,811 linked papers Snapshot 30 Jul 2026
Grow a film
- Cycles
- 1,000
- Thickness
- 110 nm
- Per cycle
- 1.1 Å
Wafer color is computed from film thickness: thin-film interference on silicon at normal incidence in daylight. Growth per cycle uses typical literature values. #4783C5
One suite, three scales
Start with the chemistry, follow the film, then the reactor.
Each module answers a different question about the same process. Use one on its own or carry results from one to the next.
Atoms to nanometres
Film growth
Simulate nucleation and film evolution on Cu(111), on a flat surface or inside a groove, and read thickness, growth per cycle and modeled mass cycle by cycle.
Current interfaceALDKIT
- Precursors
- TMA · DMAI
- Substrate
- Cu(111)
- Geometry
- planar · groove
- Outputs
- thickness · GPC · QCM mass
- Nucleation fits
- JPCC · Parsons · SAMS
Reactor, millimetres to centimetres
Process simulation
Follow precursor delivery, purge and surface reactions in cross-flow, tube and lid-gas-ring chambers, for Al₂O₃ (TMA/H₂O) and ZrO₂ (CpZr/O₃) recipes.
Example output: coverage in a holeby depth
Learn
Understand the process before you model it.
The team
Built by the MDNM team at Huazhong University of Science and Technology.
ALDKIT brings materials data and simulation workflows into one shared research environment.
Meet the teamStart from the film you need to grow.
Search the literature, check the conditions, then simulate the growth and the reactor.